半導體晶圓ICP電漿蝕刻機台機電整合控制系統
半導體晶圓ICP電漿蝕刻機台機電整合控制系統。(High Vacuum Pumping Control, High Density Plasma Generate, ICP Auto Matching Control & Monitor, Gas Flow Control, Wafer Load Lock & Deliver Control, Electronic Static Chuck Control, Chember and Pipe Purge Control)
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